Used OXFORD PlasmaPro 100 #293663573 for sale

OXFORD PlasmaPro 100 is an etcher and asher designed for semiconductor research and the development of advanced materials. It offers an integrated end-point detection system, enabling precise etch endpoint control, easy transfer of data to external systems, and improved reliability. This ecther / asher is equipped with a wide range of features which promote the highest process reliability and quality levels. One of the most important characteristics of PlasmaPro 100 is its ability to precisely etch and ash a variety of materials in a single process. This includes metals, oxides, nitrides, and polymers that can be processed in both plasma-based and electronic-based technologies. It offers precise control over both lateral and vertical etch profiles. The etcher / asher is composed of a loadlock-type process chamber and vacuum system, a gas panel and a proprietary top-mounted plasma source. The gas panel has been engineered with communication ability to external systems, as well as pressure and temperature controllers. OXFORD PlasmaPro 100 also has a high power source that is capable of producing up to 100 watts of power. This power source is able to deliver constant power and a high level of plasma uniformity across the substrate, even when processing multi-layer films. This etcher / asher can process up to three-inch substrates and is capable of achieving total etch depths of up to 30 µm. PlasmaPro 100 has numerous additional features to ensure reliable processes. It has been designed for low operating temperatures, high process selectivity, minimal mechanical vibrations, and uniform etch profiles. It also has a high throughput capability, with Substrate Cassette load and unload, and is equipped with a configurable Process Quality Assurance by monitoring the chambers. Overall, OXFORD PlasmaPro 100 is a highly-versatile, reliable, and efficient etcher and asher for the development of advanced materials. It is capable of processing a wide range of materials, has precise endpoint control, and offers high throughput. It also has an integrated end-point detection system, communication ability to external systems, and configurable Process Quality Assurance features. With its robust design and precise control capabilities, this ecther / asher provides an ideal solution for advanced material etching and ashing.