Used OXFORD PlasmaPro 100 #293807691 for sale

OXFORD PlasmaPro 100 is a high-performance plasma etcher and asher equipment developed by OXFORD Instruments Plasma Technology. This advanced tool is designed to meet the demanding requirements of research and development as well as production environments in the semiconductor, MEMS (Micro-Electro-Mechanical Systems), optoelectronics, and other related industries. PlasmaPro 100 offers a versatile platform for precise plasma processing, enabling users to achieve superior etching and ashing results on a wide range of substrates. OXFORD PlasmaPro 100 features a state-of-the-art chamber design that provides uniform plasma distribution and efficient gas utilization, ensuring consistent and reproducible processing results. The system is equipped with advanced plasma sources and control mechanisms that allow for precise tuning of process parameters such as gas flow rates, RF power, pressure, and temperature. This level of control enables users to tailor the plasma chemistry and energy to optimize process performance for specific applications. One key feature of PlasmaPro 100 is its flexibility in handling various types of substrates, including semiconductor wafers, glass, metals, and polymers. The unit offers customizable substrate handling options such as wafer sizes, chuck types, and temperature control to accommodate a wide range of sample types and sizes. This versatility makes OXFORD PlasmaPro 100 suitable for research labs, pilot production lines, and full-scale manufacturing facilities. PlasmaPro 100 is equipped with a range of gas delivery systems that support both etching and ashing processes. Users can select from a variety of process gases, such as chlorine, fluorine, oxygen, and argon, to achieve the desired etch selectivity, anisotropy, and profile control. The machine also includes a highly efficient pump tool for rapid chamber evacuation and precise control of process pressure, enhancing process repeatability and reliability. To ensure safety and compliance with industry standards, OXFORD PlasmaPro 100 is built with robust interlock systems, gas leak detection mechanisms, and emergency shutdown features. The asset is designed with user-friendly software interfaces that provide intuitive process monitoring and control capabilities. Operators can easily set up process recipes, monitor real-time process data, and analyze results to optimize process performance. In addition to its advanced processing capabilities, PlasmaPro 100 is engineered for ease of maintenance and serviceability. The model incorporates diagnostics tools and remote monitoring features to enable proactive maintenance scheduling and troubleshooting. OXFORD Instruments offers comprehensive technical support, training programs, and application assistance to help users maximize the performance and longevity of their OXFORD PlasmaPro 100 systems. Overall, PlasmaPro 100 is a cutting-edge plasma etcher and asher equipment that combines precision, versatility, and reliability to meet the evolving needs of the semiconductor and related industries. With its advanced chamber design, customizable substrate handling options, precise process control, and user-friendly interface, OXFORD PlasmaPro 100 sets a new standard for plasma processing technology and empowers users to achieve superior results in their research and production applications.