Used OXFORD PlasmaPro 100 #293818862 for sale

OXFORD PlasmaPro 100 is a leading etcher/asher equipment designed for advanced plasma processing applications in research and production environments. This advanced system provides precise control over plasma processes to achieve high-quality etching, cleaning, and surface modification of various substrates. With its flexible configuration options and user-friendly interface, PlasmaPro 100 offers versatility and reliability for a wide range of applications in industries such as semiconductor manufacturing, MEMS fabrication, and microelectronics research. At the core of OXFORD PlasmaPro 100 unit is a high-performance plasma source that generates a low-pressure, high-density plasma within the process chamber. This plasma source utilizes various gases such as oxygen, argon, and fluorine to create reactive species that interact with the substrate surface, enabling precise etching and cleaning processes. The machine is equipped with advanced RF matching networks and power supplies to deliver stable plasma conditions and uniform process results across the substrate surface. PlasmaPro 100 features a range of process gases and control parameters to optimize etching and ashing processes for specific materials and desired outcomes. Users can select from a variety of gas flow rates, pressure settings, and power levels to tailor the plasma process to their requirements. The tool includes gas flow controllers, mass flow meters, and pressure sensors to monitor and regulate the gas environment inside the process chamber, ensuring consistent and repeatable results. The process chamber of OXFORD PlasmaPro 100 is optimized for efficient plasma processing with features such as a heated chuck, turbo pump, and temperature control systems. The heated chuck allows for precise temperature control of the substrate during processing, which is crucial for maintaining surface uniformity and preventing damage to sensitive materials. The turbo pump ensures rapid evacuation of gases from the chamber, enabling quick cycle times and high process throughput. PlasmaPro 100 asset is equipped with advanced plasma diagnostics tools to monitor and optimize the plasma processes in real-time. Optical emission spectroscopy (OES) and mass spectrometry techniques provide insight into the composition of the plasma and the species involved in the etching process. This diagnostic capability allows users to fine-tune process parameters for optimal performance and material selectivity. The user interface of OXFORD PlasmaPro 100 is designed for ease of operation and control, with a touchscreen display and intuitive software interface. Users can set up process recipes, monitor model performance, and analyze process data in real-time, making it easy to optimize process parameters for different applications. The equipment also features remote monitoring and control capabilities, allowing users to access and control the system from a remote location for added convenience and flexibility. In conclusion, PlasmaPro 100 is a state-of-the-art etcher/asher unit that offers precise control, flexibility, and reliability for a wide range of plasma processing applications. With its advanced plasma source, process chamber design, diagnostic tools, and user-friendly interface, OXFORD PlasmaPro 100 is a versatile solution for semiconductor manufacturing, MEMS fabrication, and microelectronics research.