Used OXFORD PlasmaPro NGP 1000 #293587283 for sale

OXFORD PlasmaPro NGP 1000 is an etcher/asher that operates using Plasma-Enhanced Chemical Vapor Deposition (PECVD) technology. It is based on a parallel-plate, microwave-powered component, versatile enough to accommodate a wide range of applications. This model features improved deposition uniformity of thin layers with an optimal surface quality for complicated microelectronics applications. It is designed for rapid prototyping and high throughput production of thin film devices, offering high process repeatability and reliable performance. OXFORD PLASMA PRO NGP1000 is a low-pressure equipment designed to offer the highest level of component safety and reliability. This system has an in-built user friendly graphical interface and is designed to provide moderate to high rate deposition at low operating temperature level. This etcher can handle various film deposition tasks with great precision, such as thin film coatings for MEMS, thin-film transistors, ferroelectric memories and solar cells. Additionally, it can be used as a dry etcher, offering a safe and fast etching process of polymers, metals, oxides and semiconductor layers. PlasmaPro NGP 1000 has a power range of 0-500W, offering a wide range of process flexibility. It has controllable pressure range from 0.5-10 mTorr, adjustable gas flows from 10-1000 sccm, and an adjustable RF frequency which can extend from 0-13.56 MHz. The plasma is heated by a 13.56 MHz RF source, in order to generate the necessary active species to heal the etching and deposition processes without the need for additional heat. Additionally, the unit includes an independent interlocking scheme to ensure that its process container is completely safe. Overall, PLASMA PRO NGP1000 is a reliable and flexible etcher/asher that offers significant advantages in a variety of prototyping applications. It can provide repeatable and accurate results with minimal maintenance and is suitable for a wide range of industries, including microelectronics, MEMS, ferroelectrics and thin-film transistors. Its low-pressure design and easy operation makes it an excellent choice for those who are looking for a powerful and reliable deposition machine.