Used PLASMA ETCH BT-1 #9100075 for sale

PLASMA ETCH BT-1 is an etcher and asher that uses high-energy plasmas to etch and ash organic and inorganic materials. Its operation is based on a high-frequency inductive design that delivers a uniform and controllable plasma to the substrate. It is ideal for processes such as dielectric etching, metallization, and micro-fabrication. PLASMA ETCH BT1 utilizes an antenna array that generates high frequency plasma of up to 13.56 MHz in order to etch and ash a variety of materials including Si, SiO2, Si3N4, metals, and polyimide. This allows for precise and repeatable etching of thin layers of materials, such as silicon dioxide, for direct device fabrication. BT-1's etching chamber has a comfortable temperature range of 0-60°C (5-90°C with the optional high-temperature chamber). With the aid of a turbo pump and a filtration system, the chamber is able to achieve a wide operating pressure range of 0.1-500 mTorr without the need for external evacuation. This allows for a wide range of etching processes, such as etch-and-strip, metal lift-off, and deep trench etching. BT1 is designed to be easy to use, with its embedded process controller ensuring a wide range of process parameters for custom plasma etching and ashing. The embedded process controller can help optimize repeatability by identifying the ideal etching parameters based on the process parameters, especially the etch speed and uniformity. Its microprocessor-controlled, direct-coupled RF drive can also help achieve fast ramp-up and ramp-down of RF power during the processing cycle. This helps boost etching throughput and reduce the impact of sample charging. PLASMA ETCH BT-1 also comes with a wide range of optional accessories, such as a radio-frequency (RF) biased head, which helps reduce material adhesion on difficult etch materials. PLASMA ETCH BT1 is designed for high-volume and high-precision fabrication processes. It's been used in the production of micro-electro-mechanical systems (MEMS) and in the fabrication of other complex micro devices. It's a great choice for those looking for an easy-to-use etcher and asher with a wide range of process parameters and robust features.