Used PLASMA ETCH BT-1 #9308011 for sale

Plasma etcher PLASMA ETCH BT-1 is a high-temperature, low-pressure plasma etcher equipment designed to significantly reduce the cost of fabrication and assembly line production. The system consists of a high-efficiency vacuum chamber, plasma source, and covering unit. The machine is capable of etching metals, ceramics, and semiconductors with superior repeatability, precision, and accuracy. The vacuum chamber is designed to provide a clean, uniform pressure to ensure that the etching process takes place in a controlled environment. The chamber also helps to minimize surface area that is exposed to the plasma during etching, to ensure uniformity and consistency. The chamber's construction is also designed to minimize plasma emission, further protecting surrounding components and ensuring consistent results. At the heart of the chamber is the plasma source, which generates a high-temperature, low-pressure plasma which is used to etch the desired surface. The source uses a two-stage process that involves heat and chemical reactions to precisely etch materials. This process is capable of creating precise patterns and structures of complex components, making it ideal for a variety of industrial applications. The covering tool is used to apply a protective coating to the etched surface. This prevents oxidation and other damage from occurring to the material during and after the etching process. The covering material is applied automatically, further streamlining the etching process and providing the highest quality etch results. The Plasma Etcher PLASMA ETCH BT1 is a reliable and efficient tool for etching a range of materials quickly and with precision. Its applications are varied, from etching of metallic, ceramic, and semiconductor components, to preferential etching of particular material types. Its ability to generate precise patterns makes it useful for a variety of industrial applications, from manufacturing to laboratory research.