Used PLASMA ETCH BT-1C-TT #9352172 for sale

PLASMA ETCH BT-1C-TT is an advanced Asher/Etcher used for industrial and scientific purposes. It is capable of supplying high performance and precision etching of 5x5 mm surface areas with a resolution of up to 5 microns. This etcher is used for precise removal of layers which are thicker than two microns from a wide range of materials including metals, plastics, composites, and glass. This advanced equipment consists of a chamber which houses the vacuum plasmatron, a magnetron radio-frequency source unit, an inductance input unit, a transformer unit, a gas/vacuum interface, an exhaust system, and a process controller. There is also a user Interface which allows for settings modification and monitoring of process results. The plasmatron and RF source create a plasma gas which then bombards the wafer. This process etches away the surface layer at the molecular level. The gas interface and exhaust unit are used to maintain a constant temperature in the chamber and to remove the etch residue from the wafer during/ after the process. The user interface of BT-1C-TT enables precise control and monitoring of the process parameters such as power, timing, pressure, and temperature. PLASMA ETCH BT-1C-TT also has the capability to perform dry etching on a variety of materials, such as Silicon, SiC, silicon nitride, and diamond. It can be used to remove a wide range of photoresist materials from the wafer surface, as well as for pattern-directed etching and hole-sizing. Additionally, PLASMA ETCH rate can be controlled and adjusted as per the type of material, layer, and pattern size. In conclusion, BT-1C-TT is an advanced machine which is suitable for precision etching of a variety of thin layers on demanding materials. With its high resolution, high etch rate, and accurate control, it provides a reliable and cost-effective solution for many etching applications.