Used PLASMA ETCH MK-II-1 #9187172 for sale

Manufacturer
PLASMA ETCH
Model
MK-II-1
ID: 9187172
Vintage: 2005
Plasma cleaner / Etcher Electrode configuration, Horizontal planar: 8 Levels Process temperature control: 125°F to 300°F ±5°F R.F Generator & automatching network: 2000 Watts@13.56 MHz Mass flow controller (2 Channels): 0-2000 CC/min Vacuum gauge, capacitance monometer: 0-10 Torr Touchscreen control system included Vacuum pump, multiple stage, oxygen service: 355 / 30 CFM Chilled water recirculate, closed loop : 20°C ±0.5°C 2005 vintage.
PLASMA ETCH MK-II-1 is an etcher/asher designed for precision etching, annealing or surface treatments of substrates used in semiconductor device fabrication. This etcher is capable of creating a wide variety of patterns at high resolution in a variety of materials. It is a versatile tool for a wide variety of material removal techniques. At the heart of MK-II-1 is a powerful inductively coupled radio frequency (RF) source that has adjustable power up to 5000 watts. This RF source is coupled to an elaborate chamber, the main parts of which are a pair of upper and lower electrodes and a deck with adjustable shelves, which make up the process area. The process area is equipped with an insulative gas inlet, outlets for gas exhaust, an automatic shutter, and a support assembly for the substrate material. In addition to the inductively coupled RF source, PLASMA ETCH MK-II-1 also features a matching network, which helps to achieve consistent output power during operation. It also includes a variable gas flow equipment to ensure fast and efficient delivery of reactive gases to the process area. This system is composed of a high-pressure side for delivery of dry gases and a low-pressure side for delivery of liquids. MK-II-1 also includes a number of user-friendly features. Its GUI interface is easy to learn and use, and it is programmable with a variety of recipes for etching, annealing, and surface treatments. It also offers a three-dimensional unit for etching which enables precise etching of patterns on non-planar surfaces. PLASMA ETCH MK-II-1 has a number of safety features such as a door interlock machine which prevents the door from being opened while the RF power is active, and a grounded chamber to contain the electrostatic charge which builds up during operation. It also includes an alarm tool and a temperature protection asset which monitors and controls the temperature within the RF chamber. Finally, MK-II-1 is a highly durable model. Its components are constructed of stainless steel which ensures they will withstand the harsh conditions of the etching process. The equipment also has a long service life with virtually no maintenance required. The resulting excellence in performance and reliability make PLASMA ETCH MK-II-1 an ideal choice for many etching and surface treatment applications.
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