Used PLASMA ETCH MK-II #293610079 for sale
It looks like this item has already been sold. Check similar products below or contact us and our experienced team will find it for you.
Tap to zoom
Sold
PLASMA ETCH MK-II is a state-of-the-art asher/etcher designed to perform high precision etching and ashing of various thin film materials at the submicron level. This machine is equipped with a powerful Digital Micrometer-Controlled Ejaculator (DMCE) for precise adjustment of ion parameters, enabling etched results with high precision and repeatability. The DMCE also includes an auto-sensing feature which allows the user to automatically adjust the gas pressure of the etching/ashing process. PLASMA ETCH MKII's plasma-etching/ashing chamber is designed with a large basket to hold all sizes of substrates up to 19.69 inches (500 mm) in diameter. The chamber includes gas systems for two separate gas sources, such as hydrogen and argon, that can be used together for etching and ashing. The operator can select from user-programmable process etch parameters like power, pulsing frequency, and rpm, among others, for each chamber and gas source. The asher/etcher is also equipped with an in-line quartz crystal monitor to measure plasma generated during the etching process. MK-II provides automatic thermal control of the process chamber and substrates, so each can be maintained at a constant temperature. It also includes an RF shield box to reduce RF interference and reduce plasma contamination. The asher/etcher is equipped with a vacuum system with a range of 0.1-2000 torr and capable of a vacuum rate as high as 20 torr/second. In addition, an automatic exhaust system enables quick and convenient clean-up of by-products. MKII is an ideal tool for micro-fabrication, etching and ashing of thin-film materials. It provides excellent repeatability for high-precision etching and can handle any type of substrate, from single sided to dual sided. The machine features an extensive set of user-programmable process parameters and one-touch LCD interface for easy setup and operation. The in-line quartz crystal monitor allows for precise adjustment of ion parameters for reliable results, and the convenient automatic exhaust system ensures minimal clean-up time. The robust design and advanced features ensure excellent etching and ashing performance, making this etcher a great choice for those looking for reliable and repeatable results.
There are no reviews yet