Used PLASMA ETCH PE-100 #9281671 for sale

PLASMA ETCH PE-100 is an etching and ashing equipment designed for semiconductor device fabrication. It is developed by PLASMA ETCH, Inc. and is often used in the production of photolithography. The system is designed for processing wafer sizes ranging from 4-inch (10 cm) up to 6-inch (15 cm). It is a multi-purpose etcher/asher capable of performing dry etching, ashing, and thin film deposition processes all in one unit. The machine offers high-speed uniformity, which is achieved by using a built-in dual source process chamber that can be used for oxygen plasma etching or ashing. This process chamber can be tweaked to optimize for etch rate, selectivity, and uniformity. In addition, PE-100 has advanced vacuum technology that offers excellent pumping and process systems for high speed, high uniformity vapor etching and ashing with consistent results. It is also capable of precise temperature control, which results in an even and controlled substrate surface finish. It can even be used for advanced applications such as crystallization and carbon-slower etching. PLASMA ETCH PE-100 also features an automated load-lock mechanism, which easily transports wafers in and out of the tool for fast turnaround times. It also has integrated safety features, such as a low flow alarm and a stop safety switch to prevent any accidents. It is also designed for easy operation and maintenance, with easy to view control and data views. PE-100 is a cost effective and very reliable asset that is capable of delivering optimal results, making it suitable for application in semiconductor device fabrication. It is capable of accurate and efficient etching and ashing performance, while providing a wide range of materials processing capabilities.