Used PLASMA ETCH PE-100 #9402380 for sale

Manufacturer
PLASMA ETCH
Model
PE-100
ID: 9402380
Plasma system Running hours: 15 EDWARDS Vacuum pumps No chiller.
PLASMA ETCH PE-100 is an automated etching and ashing processing unit designed to provide high precision and repeatability in etching and ashing-related processes. It is configured with three processing chambers and a user-friendly touch-screen control interface. The main objective of the ETCH PE-100 is to provide a high-end, efficient, cost-effective, and reliable etching and ashing process for wafer fabrication in the semiconductor industry. In addition, it is equipped with a powerful control system that provides for increased precision and repeatability during the etching and ashing processes. The condition of the wafer during the etching process will determine the degree of etching and whether the process will be stopped or continued. This is monitored continuously and precisely with the unique 'Wafer Smoothness Analyzer' incorporated into the ETCH PLASMA ETCH PE-100 unit. This state-of-the-art device is capable of continuously measuring the surface uniformity and roughness of the wafer as it is being etched. The ashing operation of ETCH PE-100 also provides reliability and repeatability. The plasma asher processes the wafer with a high temperature plasma to quickly and effectively remove polymer-based residues. This is essential in the manufacture of ultra-fine particles, nano-particles, and other advanced components of microelectronic products in the semiconductor industry. The high temperature created by PLASMA ETCH process can be accurately and repeatedly regulated ensuring that the samples experience uniform etching or ashing. The power outsource is adjustable allowing for faster repeated cycles and the 'Real-Time Temperature Control' ensures that accurate and stable temperatures are maintained. The ETCH PLASMA ETCH PE-100 also offers high automated self-diagnostics, which allow for a high degree of preventive maintenance, providing an intelligent way to reduce maintenance and improve performance time, as well as monitoring operational performance for consistent processes. Other features of the ETCH PE-100 include selectable recipes for various levels of etching and ashing according to specific requirements, cellular mode for connecting multiple processing units, and a complete set of consumable items to ensure high performance wafer processing.
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