Used PLASMA ETCH PE-200 #9103920 for sale

PLASMA ETCH PE-200 PLASMA ETCH Equipment is an advanced plasma etcher/asher designed for the etching/ashing of planarized dielectric layers. The system is for use in low- to medium-volume plasma-related processes within the electronics industry. The unit is capable of providing precision, uniformity, repeatability, accuracy, and cleanliness in applications such as vapor phase etching, vapor phase ashing, surface cleaning, and flat-panel etching. Utilizing a multi-stage, low-pressure, low-power etching process, PE-200 can achieve very uniform etch rates and accurate etch depths across a wide range of materials. PLASMA ETCH PE-200 offers a large area chamber that can accommodate up to 200mm wafers or large pieces. High-performance electrode control is used to ensure uniformity and repeatability of process results. In addition, PE-200 provides precise control, with features such as pressure, temperature, and power monitoring during processing. The machine also includes an advanced gas dispersion tool for more efficient delivery of etchant gases to the wafer stack. The asset's user-friendly design simplifies operation, with a large color LCD touch screen display that allows for easy programming and monitoring of the various process parameters. The control model includes a database of frequently used process recipes and the ability to save, edit, transfer, recall, and recover data. PLASMA ETCH PE-200 also features a exhaust filter equipment to reduce the exhaust particle levels and prevent material build-up, as well as an intelligent gas cooling system for better gas uniformity and temperature control. PE-200 provides outstanding performance and control for the most challenging etching/ashing applications, including that of large components. The unit is an excellent choice for any environment that requires precise etching/ashing processes as well as cost savings and enhanced efficiency.