Used PLASMA SCIENCES 200W #15446 for sale

ID: 15446
Wafer Size: 3"-6"
Table top reactive ion etcher, 3"-6" Process: Upto 6" wafer per cycle (2) 3" wafers per cycle Turbo pumped Manual control Roughing pump (Rebuilt) Microprocessor controlled (3) Mass flow controllers.
PLASMA SCIENCES 200W is an etcher/asher specifically designed for production of intricate and hard to etch/ashe patterns on a variety of surfaces. The system utilizes a proprietary shielding technology and enclosed vacuum chamber to limit macro-level contaminants that can damage or distort etched/ashed materials. The low electrical noise electronics design and atmospheric pressure plasma chamber further help reduce micro-level interference and distortion. Through an intuitive user-interface, 200W allows users to adjust frequency and voltage output to achieve desirable pattern shapes and sizes as well as refine etching/ashing speed. It allows users to program up to 10 recipes to achieve consistently high quality results. Additionally, the etcher/asher offers a range of options including selectable process times, overlaid imaging, and customizable pass times. PLASMA SCIENCES 200W features a unique, energy-efficient design. Its high-power plasma is capable of delivering up to 200 watts of power and power is adjustable from 50 to 500W to easily accommodate various materials and processing speeds. The unit is equipped with an enhanced pressure control system for reliable, repeatable performance. A large view port window lets users see the process in action and the etcher/asher's fan-cooled motor effectively, and safely, vents processed air away from the work area. 200W is an easy to use and efficient solution for etching/ashing small, intricate parts and other surfaces in applications ranging from biomedical to consumer electronic production. With its clean and quiet operation, users can achieve fast, high quality results regardless of the skill level of the operator.
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