Used PLASMA SYSTEMS DES 206-254AV #9280793 for sale
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PLASMA SYSTEMS DES 206-254AV etcher/asher is a dedicated dry etcher used in industrial processes to etch and ash specialized materials. It is capable of processing organic, metal, and dielectric materials, with exacting precision and repeatability, providing a tool for a number of industrial applications. The equipment is designed around a plasma source, which generates a high-voltage, electric energy that breaks down the gas molecules in the plasma chamber to provide a combination of reactive atoms and molecules, to etch or ablate the material. The system provides highly precise control over etch rate, etch depth, etch uniformity, and other parameters. The unit consists of four major components, including the power source, the gas delivery machine, the vacuum chamber, and the sample holder. The power source is a diode-pumped frequency-tripled YAG laser, producing up to 100 Watts of power at the 3.75 μm wavelength. The laser light is focused by a set of specially-designed lenses through which the gas enters the chamber, producing a high-powered plasma. Gas delivery is provided by a gas mass-flow controller, allowing operators to precisely meter the amount of gas being added to the chamber, thereby controlling the etch rate and other characteristics. The vacuum chamber is a cylindrical stainless steel chamber with an area of 254mm in diameter, and a depth of 206mm. The chamber is equipped with a flange vacuum port, allowing for a high degree of vacuum control within the chamber, and providing a highly repeatable etching or ashing environment. Within the chamber is a scanning electron microscope, connected to the gas mass-flow controller, which further allows for precise control over etch rate and other parameters. The sample holder is a manipulator arm, held in place by an adjustable armature, which allows operators to precisely orient samples within the plasma chamber. The sampler holder is made of anodized aluminum, providing a strong, lightweight construction, with a high thermal tolerance. Moving the sample holder is aided by the tool's control electronics, allowing precise movements of the arm, and accurate etching of samples. DES 206-254AV etcher/asher is a comprehensive etching and ablation asset, providing high performance for a number of industrial and research applications. By providing precise control over etch rate, etch depth, and etch uniformity, the model is capable of providing exceptional results for a wide range of industrial processes.
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