Used PLASMA SYSTEMS DES-206254-AVE3 #9280796 for sale

PLASMA SYSTEMS DES-206254-AVE3 is an industrial etcher and asher, often used for large-scale production applications. The equipment is composed of two main components, an etcher chamber and an asher chamber, each of which is specifically designed to perform separate but related processes. The etching chamber works by creating a vacuum and then introducing a reactive gas (such as chlorine) and a plasma source (such as a magnetron). This combination of gases and plasma energy causes an ionization process to occur, separating the material into its elemental components. This process causes the material on the substrate to be removed (or etched) from the surface. The ashing chamber works by introducing a reactive gas such as nitrogen or oxygen and a plasma source. This combination of gases and plasma energy causes a combustion process to occur, breaking down the material and leaving a clean surface. This process is used to clean and prepare the substrate so that it is ready for the next process. DES-206254-AVE3 has a number of additional features, such as an adjustable pressure system, a temperature control unit, and a number of safety features to prevent situation such as gas leaks and electrical sparking. Additionally, the machine can be programmed to perform multiple processes in a programmable sequence, allowing the user to automate the etching and ashing processes. PLASMA SYSTEMS DES-206254-AVE3 is a reliable, robust, and efficient tool designed for large-scale industrial applications. It is a versatile machine that can be used for a wide variety of etching and ashing processes. Additionally, its programmable sequence feature and adjustable pressure and temperature systems make this machine well suited for complex, multi-step operations for almost any production application.