Used PLASMA SYSTEMS DES-212-304AV #9226217 for sale

PLASMA SYSTEMS DES-212-304AV is a high quality, versatile etcher / asher equipment used for etching or ashing metals, ceramics, semiconductors, and other materials. This system is optimized for etching or ashing by controlling temperatures, etching gases, and sizes in order to obtain precise definition of features across the entire wafer surface. DES-212-304AV is part of the DES family of etchers from PLASMA SYSTEMS, designed to provide a cost-effective and easy-to-use solution for applications requiring tight control of repeatable results. This unit includes a weatherproof powder-coated stainless steel cabinet, an interior immersion-cooled etching chamber, a vacuum machine with a rotary multi-position and safety controller, a safety control tool, and an overhead exhaust port. The interior of the chamber is lined with stainless steel for thermal and mechanical stability. The vacuum asset is a three-stage "forced" model, which creates a maximum vacuum of 40 psi within the chamber to allow precise control of etching or ashing conditions. PLASMA SYSTEMS DES-212-304AV is an etcher / asher designed to provide repeatable results in order to produce higher yields. The rotary multi-position and safety controller provides precise control with a regulated adjustable flow rate, and precise time and temperature settings, allowing the user to achieve repeatable results. The integrated safety control equipment helps to ensure safe operation with controls on the chamber door and safety interlock switches. The metal cabinet is designed to provide a Thermal Environment Protective (TEP) aluminum substrate for electrical and mechanical isolation from the interior of the chamber. DES-212-304AV is designed to meet requirements of Class 3 Industrial environments, with a variety of mounting options and support accessories. This system is designed to be used with a variety of specialty chemicals, including chromates, etchants, and anti-etchants. With these features, PLASMA SYSTEMS DES-212-304AV is an ideal choice for etching or ashing metals, ceramics, semiconductors, and other materials in laboratories, universities, and industrial applications.