Used PLASMA SYSTEMS DES-220-459-AVL #293618275 for sale

PLASMA SYSTEMS DES-220-459-AVL is a state of the art etcher/asher equipment specifically designed for the semiconductor industry. It is equipped with a high-frequency, multi-frequency plasma generator that can produce a wide variety of plasmas at potentially aggressive levels of substrate etching. DES-220-459-AVL is unique in its ability to generate plasma that is effectively tailored to different material surfaces, allowing it to achieve maximum etch rates while preserving surface integrity. This makes the system ideal for usage in the manufacturing of complex, state-of-the-art integrated circuits. PLASMA SYSTEMS DES-220-459-AVL is equipped with a built-in Power Selective Material (PSM) Selector, allowing high-precision control over the materials used in etching and ashing. This helps to provide greater accuracy and flexibility in the manufacturing of integrated circuits and other components. The power selector also provides the flexibility to choose the optimal parameters for each material, increasing the efficacy of the process. DES-220-459-AVL features a powerful RF Generator and an advanced Controller Unit. The RF Generator offers frequency adjustment from 250 kHz to 1 MHz and radio modulation, allowing for etching of different types of materials at optimal levels. The advanced Controller Unit is able to fully adjust the process parameters and conditions, allowing for greater flexibility and accuracy of the process. Also included in the unit are the Negative Pressure Substrate Holder and the Gas Distribution Machine. The Negative Pressure Substrate Holder holds substrates firmly in place, helping to ensure accuracy and prevent particles from entering the etching chamber. The Gas Distribution Tool provides improved gas uniformity and minimizes the occurrence of etching defects, helping to further improve the quality of the process. PLASMA SYSTEMS DES-220-459-AVL is a powerful etcher/asher option that provides unsurpassed accuracy, flexibility, and control. It can be used to create complex integrated circuits with superior results, and is an ideal option for those in the industry who require maximum performance in their etching and ashing processes.