Used PLASMATECH RIE-80 #9249321 for sale

Manufacturer
PLASMATECH
Model
RIE-80
ID: 9249321
Reactive Ion Etcher (RIE) P/N: HFC-E-202.
PLASMATECH RIE-80 is a advanced etcher / asher used for chemical and physical removal of thin layers of material from the surface of a substrate. This powerful tool is capable of removing the material with the utmost accuracy and precision, allowing for very precise control of the etch process. RIE-80 is a remotely operated etcher / asher designed for use in a laboratory setting. It features a large, open frame construction with a gas inlet, chamber, and outlet. Its full-sized chamber is designed to provide maximum etching throughput. The chamber contains two sample holders and a sample table, allowing up to eight samples to be processed at a time. PLASMATECH RIE-80 is equipped with advanced Process Control, which provides fully automatic process monitoring and control. This allows for precise control of the etch parameters, from gas flow, to temperature, pressure, and timing. This makes RIE-80 ideal for applications that require extremely high precision in controlling the etch process. PLASMATECH RIE-80 features a three-axis CNC-controlled gimbal system, allowing for fast and precise tilt motions for scanning, etching, and wafer rotation. This system is designed for high-throughput etching operations, and provides accurate control of the rotation and tilt of the wafer. RIE-80 is also equipped with an advanced, high resolution optical microscope, which is used to verify the quality of the etch results. PLASMATECH RIE-80 is a powerful and accurate etcher / asher designed to provide efficient and precise control of the etch process. It is capable of processing up to eight samples simultaneously, and is equipped with advanced Process Control and CNC-controlled gimbal systems for fast and accurate wafer tilt motions. RIE-80 is capable of producing highly precise etch results with excellent precision and accuracy, making it a great choice for laboratory applications.
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