Used PLASMATECH RIE-80 #9249711 for sale

PLASMATECH RIE-80
Manufacturer
PLASMATECH
Model
RIE-80
ID: 9249711
Reactive Ion Etcher (RIE) P/N: HFC-E-202.
PLASMATECH RIE-80 etcher / asher is a Plasma Enhanced Dry Etcher that is designed for a variety of applications ranging from the removal of metal layers to dielectric passivation and deposition. The equipment can be used for semiconductor devices, Optoelectronics, capillary etch, dielectric packing, and many other substrates. RIE-80 uses an RF power supply and indirect plasma source to create an energetic plasma environment which helps to improve the etching characteristics of the substrate, while reducing the consumption of gas and process time. The system consists of a load-lock chamber, a vacuum chamber, and a processing chamber. The load-lock chamber is used as a buffer area to ensure clean, free from dust substrates before entering the processing chamber. The vacuum chamber serves to maintain a low-pressure environment which resists random particles entering the plasma. The processing chamber contains the entire etching process and is outfitted with a 6-axis manipulator, the power supply, and the RF plasma source. The unit is equipped with an RF power supply of up to 2 kW and a W—type dual filament inductively coupled plasma source connected to a waveguide. The ground potential printed circuit board ensures a perfect electrical connection with the RF source. PLASMATECH RIE-80 etcher / asher offers precise control over the etching process. The power level and timing are set manually and the machine is able to hold a set process for each substrate to minimize manual intervention. Users are also able to monitor the process in real time, including pressure, temperature, and process time. The tool offers excellent resolution, with a typical resolution of 0.1µm, making it suitable for high precision work. Overall, RIE-80 is an efficient and reliable etch / ash asset suitable for many applications. It offers excellent control over the etching process and the ability to monitor the process in real time. Its high resolution makes it suitable for high accuracy work and its gas consumption is lower than other systems. The model is designed for easy maintenance, which ensures a long service life.
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