Used PLASMATHERM 770 ICP #9156681 for sale

Manufacturer
PLASMATHERM
Model
770 ICP
ID: 9156681
Wafer Size: 8"
Vintage: 1997
Ion coupled plasma (ICP) etcher, 8" Load lock shuttle lock transfer Single chamber ICP Watlow heater RFPP – RF5S & 20M power supply with AM5 (6) Zone heater PM5 Pressure controller RF20M with phase Model 919 Hot Cathode Controller VAT Adaptive Pressure Controller (8) MFCs-gas: BCL3,Cl2,HBr,N2,N2,N2,H2,N2 Leybold 600C Leybold D40B CS Leybold D16B Plasmatherm PC OS Sofie Endpoint 1997 vintage.
PLASMATHERM 770 ICP is an advanced etching and ashing equipment from PLASMATHERM. It offers superior etching and ashing performance and includes a range of features designed to ensure uniform precision and reliability. The system features an advanced electrical power source providing high ionisation density, uniform etching profiles, and increased process stability. The fast switching power source offers flexibility with various capacitances and pulse lengths available. This enables optimization of the etch rate for a given process. It also enables adjustment of the output power for each etch procedure, to achieve the best process profile and repeatability for the entire batch. 770 ICP also includes a unique integrated two-Zone Ceramic Lined chamber, which allows for etching and ashing in one unit. The Process Gas Chamber is operated with nitrogen, oxygen, and other reactive gases enabling etching and ashing of various materials. The Integrated Open Load Lock ensures easy loading and unloading of wafers without introducing additional contamination. The load locks can be easily accessed from both sides of the chamber for loading the samples. The unit includes advanced controls allowing for precise process monitoring and automatic thermal control. A highly sensitive thermoelectric temperature probe measures wafer temperature during plasma processing. The uniformity of the process is further monitored by the infrared pyrometer. The software also includes recipe-driven user interface enabling easy selection of process parameters. The intuitive GUI brings self-explaining process control to the user. It includes user-friendly, graphical, and text status displays to guide the operator through the set up and recipe selection process. It offers automatic safety warnings and clearly communicates processing errors. PLASMATHERM 770 ICP is the ideal machine for etching and ashing and provides superior reliability and accuracy. It's integrated hardware and software features ensure that any process can be performed to the highest quality and repeatability.
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