Used PLASMATHERM 770 ICP #9156791 for sale

PLASMATHERM 770 ICP is an etcher/asher equipment that enables the rapid, reliable, and economical production of advanced semiconductor products. The system works by combining low-pressure plasma processing, high-precision gas inlet systems, and digital temperature control to enable precise and repeatable results. It is capable of achieving addressable resolutions of 10um and features a wide range of process parameters and capabilities, making it suitable for both production and research applications. 770 ICP etcher/asher unit can be used for both wafer and non-wafer etching applications, including silicon, organic films, ceramics, glass, vacuum deposition, and MEMS. With its low-pressure plasma process and high-voltage/low-power plasma sources, it is designed to achieve the desired etching process uniformity with minimal material damage and contamination. This makes it ideal for a range of applications, such as gate etching, via etching, fin etching, and resist stripping, as well as ambient cleaning and sputtering. The machine is equipped with a high-precision gas inlet tool that features up to three gas lines and an integrated pressure controller. It is also equipped with a digital temperature controller, allowing for accurate and repeatable temperature control. This ensures that the desired etching process conditions are achieved and maintained. PLASMATHERM 770 ICP etcher/asher asset is easy to use and maintain due to its simple and intuitive design. It features an intuitive graphical user interface, allowing users to quickly program and control the etching processes. The model also features built-in safety features to prevent accidental damage and contamination, as well as a remote control facility for easy operation from a distance. 770 ICP etcher/asher equipment represents the ultimate in etching technology, enabling rapid, reliable, and economical production of advanced semiconductor products. It is an ideal choice for manufacturers and research centers looking for an advanced etching solution.