Used PLASMATHERM 790 RIE #9055603 for sale

PLASMATHERM 790 RIE or Reactive Ion Etching equipment is a state-of-the-art crystalline structure and thin-film etching system designed to meet the highest requirements for today's advanced semiconductor processing applications. It is designed to be user-friendly and offer high quality process reproducibility. 790 RIE uses a gas-assisted etching process that combines multiple etching parameters in one unit. This gives the user total control over the etching process. Users can easily set and monitor all the parameters including, RF plasma power, pressure, gas control, and temperature. The machine features a vacuum chamber with a no-leak structure which assures a totally anaerobic environment. This allows for a high degree of repeatability of the etching process. Furthermore, the user can adjust and control all components of the process at any point in time. PLASMATHERM 790 RIE is able to accommodate wafers up to 4 inches in diameter, and uses materials from metals and alloys to ceramics, quartz and organic substances. It's also capable of processing thin films, complex structures and high aspect ratio structures such as holes and stepped crystals. The tool is equipped with state-of-the-art electronics, a computer/user interface, and integrated safety programs. These technological innovations allow for precise control of parameters during the etching process. 790 RIE offers reliable, high quality results. It achieves a high overall process quality due to its unique process technology which combines high selectivity with high accuracy. Furthermore, its wide range of parameters provide excellent etching conditions for a variety of materials and substrates and its user-friendly design ensures perfect control over the process. These features make it a first-class tool for many industries producing advanced semiconductor products.