Used PLASMATHERM 790 Series #9308031 for sale

PLASMATHERM 790 Series Etcher/Asher is a versatile advanced deposition and etching equipment for advanced applications such as thin-film etching and electromigration. It offers high plasma density and flexibility for optimizing oxide etching, via etching, and shallow trench isolation (STI). It utilizes a parallel plate plasma configuration which can be easily programmed to achieve precise control of process parameters. The system's chamber is manufactured from stainless steel and is heated to ensure uniform thermal distribution and process stability. The front side of the chamber is equipped with loadlock for sample loading and unloading, two tape pedestals for substrate support, and a substrate holding mechanism with adjustable blades to supply uniform plasma distribution to the substrate. 790 Series Etcher/Asher is equipped with a pair of touchscreen user interface controls and an intuitive graphical user interface that allows easy operation of the unit. It utilizes a redundant mass flow controller to accurately control gas flow and to provide unparalleled repeatability. Users can customize etching process parameters to achieve the desired results. It also features an industry leading high-energy, high-pressure radio frequency (RF) power supply that can generate up to 130 watts of power, allowing the machine to be used safely and efficiently. A ruggedized chiller tool ensures accurate process temperature control during the etching process, while an advanced vacuum asset ensures an ultra-clean environment throughout the process. PLASMATHERM 790 Series Etcher/Asher is capable of operating at high temperatures and pressures, making it ideal for etching and annealing of delicate materials such as silicon and quartz. The model also offers optional extended depth capabilities for ash and deposit processes. In addition, the equipment is capable of supporting up to 15" x 16" inches substrate which makes the system suitable for a wide variety of applications. 790 Series Etcher/Asher is ideal for research, manufacturing and engineering applications, including the fabrication of through-silicon vias (TSV) and 3D integrated circuits, TFTs, and thin-film etching and deposition. The unit is also ideal for use in the semiconductor, MEMS, and optical industries, making it one of the most cutting-edge etching and deposition systems on the market.