Used PLASMATHERM 790 Series #9382207 for sale

PLASMATHERM 790 Series of Etcher / Asher systems is a high-performance, multi-functional unit designed to provide precision and advanced technology to a variety of etching and ashing applications. 790 Series employs an advanced, multi-zone, high-vacuum, electrostatic chuck plasma source, enabling precise gas control and uniform temperature distribution. This creates a sterile and low-pressure environment, making it particularly suitable for applications such as reactive ion etching, ashing, and deposition. The platform's active gas delivery equipment is composed of a high-accuracy digital vacuum pump, mass flow controller, integrated exhaust system, and a computer-controlled software interface. This combination of precision hardware and software enables the user to accurately and precisely adjust gas flow, pressure, and ion energy parameters, further helping to ensure the repeatable processing conditions that are so critical to the etching and ashing process. The unit's advanced design facilitates a range of programmable, automated approaches. It allows users to customize each operation with minimal effort, and has been engineered for efficient and precise manual operation. Pre-established operational profiles can also be used for controlled and repeatable processing. PLASMATHERM 790 Series is compatible with a range of silicon photomasks and non-conductive substrates, including quartz, silica, alumina, and polyamide. The machine's automated load-unload feature enables easy placement and transport of wafers and other substrates, and its safety interlock prevents unexpected arcing or high-temperature exposure. The versatile 790 Series is available in multiple model configurations, and can be tailored to suit the operator's processing needs. It is an ideal tool for etching and ashing applications that require strict control of temperature, gas flow, and pressure. Its simple, consistent operation allows users to produce a wide variety of precise etches and ashes, with superior results relative to conventional methods.