Used PLASMATHERM 790 Series #9382215 for sale

ID: 9382215
Reactive Ion Etcher (RIE) / PECVD System.
PLASMATHERM 790 Series is a sophisticated etcher and asher equipment designed for use in a wide range of nanotechnology applications. Its unique combination of process control, resource economy and power efficiency makes it the ideal device for high precision etching and ashing operations. 790 Series features a plasma source to generate highly controllable, high purity plasma for etching and ashing of substrates. PLASMATHERM 790 Series incorporates a range of precise process control parameters to allow for the precise control of plasma parameters including power, pulse rate, pulse width, etch time, etch depth, ashing time, ashing depth, reactant flow and injection rate. This control combined with the system's ultra-low vacuum level of 10-2 mBarr., and an extremely short clean sequence of just 3 minutes make it ideal for high throughput applications. 790 Series is designed to be highly efficient and resource sparing. It is powered by a low voltage power supply and features advanced power saving features. The state of the art PLC control unit offers optimized process control and precise control of process parameters. The PLC interface is user friendly, and graphical operation enables rapid process setup. Safety is top priority. PLASMATHERM 790 Series provides an advanced fire and smoke detection machine and a remote emergency shutoff. The tool is supplied with a hinged cover equipped with a contact switch for operator safety. Infrared temperature sensing is also implemented for process monitoring and control. 790 Series has a wide range of process and control options making it an ideal device for a variety of user requirements. Its built-in diagnostics asset and extensive I/O capabilities allow for easy integration into existing lab-scale, manufacturing, and production lines. This user friendly model is compatible with a variety of substrates.
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