Used PLASMATHERM 790 #293729354 for sale

Manufacturer
PLASMATHERM
Model
790
ID: 293729354
Wafer Size: 2"-6"
Vintage: 1993
Reactive Ion Etcher (RIE), 2"-6" Single chamber Material used: Gas and Silicon MFC: N2/SiH4/HE, HE, NH3 Pump HX75 Chiller RF No loadlock Throttle valve Ion gauge controller: Manometer Gas panel Fluid input panel Temperature control system Operating system 1993 vintage.
PLASMATHERM 790 is an etcher / asher that is designed for accurate and repeatable processing of materials. It is equipped with an automated process control platform that provides an easy-to-use, precise and repeatable process. The system is designed to process various types of samples such as polymer, metal, or metal-polymer composites. It is capable of reaching very high temperatures, up to 800°C, to provide precise, repeatable etch and ashing solutions. The tool includes a powerful, low maintenance vacuum pump. The pump ensures constant and accurate pressure in the chamber that ensures a precise process and eliminates the need for frequent maintenance. The innovation in this platform is to provide the user with precise results over time, reducing the need for frequent throttling or adjusting of the pressure. The body of 790 is designed to be robust and reliable and designed for continuous routine operation. It is equipped with reliable safety systems that prevent any injury or damage to the users and equipment. It has alternating several and even more than one high-frequency power supplies for precise power control over the entire etch and ashing process. It also provides a wide range of control with its automated process control platform, allowing for easy access to advanced features. Through this platform, the user can choose between a manual or an automated etch and ashing process. The different process profiles can be programmed from a PC software, which also controlled all aspects of the etching and ashing process. Moreover, the user can manage the temperature and pressure in the chamber, the flow of gases and the exact amount of energy to deliver to the material. Overall, PLASMATHERM 790 provides the user with precision, repeatability and reliable operation. It is an ideal tool for advanced materials processing and is suitable for both research and industrial usage. It also offers an automated process control platform that allows the user to easily program the process with minimum effort and enjoy full control over the etch and ashing process.
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