Used PLASMATHERM 790 #293800249 for sale

PLASMATHERM 790 Series is an advanced etcher and asher used in semiconductor fabrication applications for a variety of materials. It is a multi-chamber etch equipment that can process five wafers, up to 8-inch/200 mm diameter. It has three chambers that provide a high level of process flexibility including low-temperature etching, high-temperature etching, and ashing. The process capabilities of the system include etch rates up to 20 μm/hour and etch depths up to 18 μm. 790 Series is equipped with an advanced plasma source to ensure maximum uniformity and repeatability for all etching and ashing processes. High-frequency power supplies, which support advanced plasma control, allow users to precisely control the plasma parameters in the etch chamber. Additionally, the unit is equipped with advanced monitoring and control features, such as closed-loop feedback on the plasma parameters, end-point detection, and automatic wafer alignment. The machine is designed to meet the rigorous environmental and safety requirements of semiconductor fabrication facilities. It can operate in Class 1 clean environments, with adjustable flow of clean dry gas, positive pressure isolation and quick gas exchange. The tool is also equipped with a gas filtering asset to ensure optimal protection against process contamination. The model is compatible with a range of chemistries, including argon, helium, nitrogen and oxygen, as well as a range of etch and ashing materials, such as Si, GaAs, polyimide, metals, and photoresists. This allows users to quickly switch between different etch processes and materials with minimal set-up times. PLASMATHERM 790 Series provides a versatile, efficient, and reliable etch equipment for semiconductor fabrication applications. Its wide range of chemistries and etch materials combined with its advanced plasma source and flexible, high-performance features make it a great choice for demanding semiconductor environments.