Used PLASMATHERM 790 #9124022 for sale

Manufacturer
PLASMATHERM
Model
790
ID: 9124022
Wafer Size: 2"-6"
Vintage: 1993
PECVD Deposition system, 2"-6" PC OS controlled 8" Electrode Advanced Energy RFPP - RF5S power supply Gas panel: 5 MFCs- N2, SiH4, NH3, N2, CF4 NESLAB RTE III Chiller Power supply: 208 V, 3 Phase, 60 Hz 1993 vintage.
PLASMATHERM 790 is a high-precision etcher/asher designed for a variety of R&D and production applications. It is equipped with a powerful, stable, and precise plasma source with an optimal high selectivity efficiency. The equipment uses advanced microwave plasma technology to achieve maximum etch and ash reproducibility, process accuracy, and overall quality control. 790 utilizes a robust RF power supply alongside an advanced laser-based control system and high-efficiency plasma emitter to enable precise process control and tailored throughput. At its core, this unit features a patented ASI (Atomistic Machine Interface) that provides the ability to program each processing step separately, allowing for complex processing and demanding requirements. The tool offers advanced timed processes for process optimization that can be fine-tuned via a variety of parameters. It is also equipped with advanced control tools that can help achieve uniform etch depths and process geometries. In addition, PLASMATHERM 790 includes fast and reliable repeatability capabilities to ensure consistency in the results throughout a production run. The asset offers multiple process options — such as gas etching, high and low pressure plasma etching, reactive ion etching (RIE), and nanostructuring — that can be integrated into a single-wafer run using advanced CAD modeling, modelling animation, and integrated optical inspection. The model also features an integrated two-stage vacuum equipment that provides unparalleled control over the plasma source, giving the system an excellent process versatility. In addition, 790 comes loaded with advanced features such as temperature monitoring, RF flooding, process evaluation and optimization, and product acceptance tests to ensure accuracy and repeatability. With its integrated software package, users can monitor and analyze plasma operations and create custom recipes for specific applications. The unit's user-friendly interface allows for simple and intuitive operation and configuration. Overall, PLASMATHERM 790 is an ideal etcher/asher for demanding applications. It offers a versatile, high-precision etching/ashing process, coupled with exceptional control capabilities. This machine is highly reliable, repeatable, and cost-effective, making it an attractive option for businesses looking to keep their production lines running efficiently.
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