Used PLASMATHERM 790 #9156794 for sale

PLASMATHERM 790 is a plasma etcher/asher that provides excellent etching and ashing performance for a wide range of applications. 790 has a multi-gas array design and plasma load-lock, making it the ideal platform for both etching and ashing. The multi-gas array design of PLASMATHERM 790 allows the user to configure the flow of multiple gases into the etching chamber. The plasma load-lock also allows for the introduction of various gases into the etching chamber without the need for unloading and reloading of substrates. 790 comes with an automated control equipment for precise etching. The infrared temperature control system helps to maintain temperature stability throughout the etching process, while the precision low-VOC gas delivery and integrated plasma control unit allows for precise control of etching parameters like bias voltage, radio frequency (RF) power, and chamber pressure. The automatic control machine helps minimize etch uniformity and improve etch depth uniformity. PLASMATHERM 790 is designed to accommodate both small and large substrates and has a high speed etching/ashing throughput. The large chamber size and powerful RF generator allow for effective etching/ashing of thicker wafers or substrates, making this etcher/asher ideal for production or research purposes. 790 is compatible with a range of precursor materials, such as Oxygen, Argon, Helium and Hydrogen, which provides users with flexibility and control over the etching process. PLASMATHERM 790 has a well-insulated chamber structure, inside of which is a quartz plasma zone that provides excellent uniformity and repeatability. The enclosed, gas-tight design of the plasma chamber allows for minimal particle, heat, and noise generation, making this etcher/asher ideal for use in cleanroom environments. The high stability of 790 also makes it highly compatible with high-N2 etching processes. Overall, PLASMATHERM 790 is an excellent choice of etcher/asher for various etching and ashing needs. The intelligent design of 790 and automation control tool helps to simplify the etching/ashing process, providing users with greater accuracy and improved process uniformity. In addition, the enclosed chamber and insulation design helps to reduce heat, vibration and noise while providing superior temperature stability for better etching/ashing results.