Used PLASMATHERM 790 #9230292 for sale

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Manufacturer
PLASMATHERM
Model
790
ID: 9230292
Vintage: 1993
Dual chamber RIE/PECVD system Left chamber: RIE O2, H2, CF4, CH4, SF6, CHF3, Ar Right chamber: PECVD N2, N2O, 2% SiH4 in N2, 2% SiH4 in He, NH3, CF4 + O2, He, Ar Heater: Depositing oxides and Nitrides (250°C - 300°C) Manual / Automatic mode RF Generator Maximum RF power: 500 W 1993 vintage.
PLASMATHERM 790 is an advanced etcher and asher equipment used in semiconductor manufacturing. It is designed to be highly efficient and precise, providing lithography-quality etching results with maximum repeatability. The system utilizes robust etching control and a vacuum chamber technology for ultra-low doping levels and controlled profile control. 790 is capable of providing superior process improvements through improving uniformity, extending the lifetime of etching tools, increasing throughput, and improving yield. PLASMATHERM 790's advanced technology utilizes direct-write etching, a method that uses a focused beam to etch up to 4 layers of a given material. This method achieves higher fidelity than sputtering, ion beam etching, and laser ablation. 790 is able to etch and re-etch materials at an impressive accuracy of 2 micron feature size or larger. This allows manufacturers to create finer designs and smaller features. The unit has a 10 W RF power supply, which provides the ability to etch at higher rates, while ensuring minimal ion contamination. Additionally, the protective coatings of PLASMATHERM 790 are designed to maintain consistent progress rates across each etch process. This ensures uniformity and eliminates the need for frequent adjustment of etch parameters. 790 also has in-situ cleaning and re-etching options. This is a significant advantage over older processes which require manual cleaning processes in between etch steps. In-situ cleaning and re-etching reduces misalignment issues, improving yield. Additionally, this machine is capable of providing improved process stability and reduced etch particle generation, fluctuations, and overdriving. PLASMATHERM 790 is designed for use in OEM medical, telecom, automotive, and consumer electronics productions. As such, the tool is capable of semiskilled operation for basic materials processing. Indeed, 790 has proven to be a reliable and user-friendly asset, with its intuitive Graphic User Interface and comprehensive knowledge database enabling easy operation. Moreover, the model is fully automated, convenient, and robust, with its high performance and user-friendly functionality ensuring repeatable and reliable etching results in the manufacturing of delicate components.
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