Used PLASMATHERM 790 #9296262 for sale

Manufacturer
PLASMATHERM
Model
790
ID: 9296262
Wafer Size: 8"
Vintage: 1998
PECVD System, 8" RIE Dual chamber Manual load Non-load lock RFPP RF5S RF Power supply with matching network RF 350W Power supply LEYBOLD Turbo pump Gas distribution panel: (4) MFCs Operating system: Windows 1998 vintage.
PLASMATHERM 790 is an advanced, highly precise, etching and ashing equipment. It is the latest model created by PLASMATHERM, a leader in the production of etching and ashing systems. 790 is a system designed for various applications including etching, ashing, and deep reactive ion etching (DRIE). The unit is capable of etching large area substrates (up to 433 x 390mm) with high process repeatability. PLASMATHERM 790 is equipped with an innovative configuration that minimizes gas consumption and optimizes machine performance. It features a low-profile turbo pump for high capacity vacuum systems and a wide chamber design for easy maintenance. It is rated to produce more than 200mbar vacuum pressure and a temperature range of up to 300°C. 790 has an integrated control unit and safety tool that allows users to program and monitor etching processes. It is equipped with clean-in-place technology and flexible safety protocols, allowing it to monitor and protect against asset overloads. PLASMATHERM 790 is a versatile etcher and asher that can accommodate a wide range of substrates, from metals and glasses to plastics and polymers. It is designed to work with a variety of sensitive materials, including thin films, transparent materials, and miniaturized devices. In addition, 790 offers various hardware and software upgrades, such as the ability to run precise electrochemistry and process steps. It offers sophisticated etching recipes to enable high-precision etching with large batch processing capabilities. PLASMATHERM 790 is a powerful and reliable etcher and asher, capable of producing high-quality etched parts. Its high process repeatability provides great etching results and allows for optimal process control and flexibility. It is the perfect model for applications requires high precision etching and ash processing.
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