Used PLASMATHERM AMNS-3000E #293618168 for sale

PLASMATHERM AMNS-3000E is an advanced etcher / asher for use in the fabrication of electronic, optoelectronic, and microelectronic devices. The equipment is designed for both low and high temperature reactive ion etching and etching of silicon, glass, and organic materials, as well as silicon-based alloys. Its wide range of features, low power consumption, and reputation as a reliable and cost-effective system make it an ideal choice for a variety of industry applications. The unit incorporates several control options, enabling users to customize their operations and obtain the desired results. One of these features is the built-in programmable controller, which permits users to monitor and adjust several parameters, including gas pressure, voltage, frequency, pulse duration, pulse type, and waveform shape. Additionally, the machine is capable of monitoring and controlling the temperature, humidity, and pressure within the chamber, which allows for precise and repeatable process results. The tool utilizes a patented plasma source, capable of generating a powerful microwave waveform with a wide frequency range in order to obtain high etching rates. The waveforms also stimulate various types of ionized materials for more efficient etching. The waveforms produced can be customized to meet user requirements, allowing for fast and reliable process optimization. AMNS-3000E is also equipped with innovative safety features, such as a cabinet interlock asset and a programmable high voltage monitor that prevents excessive voltage build-up. This model also features a pressure-sealing mechanism to prevent pressure changes inside the chamber, ensuring accurate and repeatable results. At the heart of the equipment is the high-precision vacuum deposition chamber, which has been carefully crafted to deliver precise etching and deposition results. The chamber includes dynamic temperature control, multiple gas injection ports, rotation and lateral motion capabilities, as well as various gas injection velocity control, allowing for improved process accuracy. PLASMATHERM AMNS-3000E is a versatile, high-performance etching system, offering exceptional value for money. This advanced etcher / asher is an ideal choice for a wide range of industry applications such as computer chip manufacturing, optoelectronic devices, MEMS, and microfluidic devices.