Used PLASMATHERM Gen 4 Mask IV #9304311 for sale
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ID: 9304311
Plasma etchers
(3) Chambers
Mask size: 152mm
SMIF pod loader
Buffer station
Load Module (LM)
Transfer Module (TM)
Types of pods: RSP types - ENTEGRIS PEEK pod, GUDENG PEEK pod and ENTEGRIS ABS pod
Buffer station: Mask staging with positive air flow mini environment
Operating system: Windows NT
(3) Process modules (PM): PM1, PM2, PM3
Module: Gen4
Process: Quartz (PM1), MoSi (PM2), Chromium (PM3)
SEIKO SEIKI Turbo pump
Turbo size: 1300 L/sec
PM1:
Channel / DET41 / MFC sccm
CH-01 / SF6 / 5
CH-02 / He / 100
CH-03 / O2 / 200
CH-04 / N2 / 150
CH-05 / Ar / 200
CH-06 / CF4 / 100
CH-07 / CHF3 / 200
CH-08 / H2 / 100
PM2:
Channel / DET42 / MFC sccm
CH-01 / SF6 / 100
CH-02 / He / 100
CH-03 / O2 / 20
CH-04 / N2 / 150
CH-05 / Ar / 100
CH-06 / CF4 / 100
CH-07 / N2 / 100
CH-08 / N2 / 100
PM3:
Channel / DET43 / MFC sccm
CH-01 / CL2-toxic / 200
CH-02 / He / 100
CH-03 / O2 / 50
CH-04 / N2 / 150
CH-05 / Ar / 25
CH-06 / N2 / 100
CH-07 / N2 / 100
CH-08 / N2 / 100.
PLASMATHERM Gen 4 Mask IV is a state-of-the-art etcher/asher designed for achieving precise etching and ashing results on a wide range of materials and substrates. This machine is ideal for producing high-quality etched and ashed components, offering superior accuracy and repeatability. Gen 4 Mask IV features an LCD touchscreen display, which allows users to control various process parameters such as gas type, pressure, and time. Additionally, the machine has automated control systems that can be easily programmed according to the specific needs of each project. PLASMATHERM Gen 4 Mask IV is equipped with a modern venturi-style gas equipment that ensures uniformity and precision of the gas flow rates and temperatures required to achieve consistent results. In addition, the machine is equipped with advanced plasma source systems that provide superior etching and ashing speeds to reduce turnaround times. Furthermore, Gen 4 Mask IV is designed to minimize plasma damage to the substrate, allowing for maximum process accuracy and high production yields. PLASMATHERM Gen 4 Mask IV also includes a unique multi-valve thermal regulation system that allows users to choose from multiple pre-defined temperature profiles. The unit is designed with a broad temperature range of 0-200°C, which provides users with the flexibility to create the perfect set of conditions for their etching and ashing requirements. In addition, Gen 4 Mask IV is extremely easy to install and use. Its intuitive user interface ensures efficient operation, allowing users to quickly and easily access all of the required information needed to get their projects off the ground. Moreover, the machine is equipped with an advanced air cooling machine that reduces operating temperatures in order to increase yield and improve process stability. PLASMATHERM Gen 4 Mask IV is an ideal etcher and asher for achieving precise etching and ashing results on a wide range of materials and substrates. With its advanced features and user-friendly design, this machine provides users with the flexibility and accuracy needed to create high-quality components that meet their exact specifications.
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