Used PLASMATHERM Gen 4 Mask IV #9386140 for sale

PLASMATHERM Gen 4 Mask IV is an etcher and asher used in a variety of industrial applications. It is designed to work with a variety of materials to provide solutions for precision etching and ashing processes. It features a built-in RF/DC generator that enables a high-power etch with a wide process window and low gas consumption. This etcher and asher also features an adjustable substrate holder, making it suitable for use with both flat and raised substrates. The etcher and asher utilizes a maximum 13.5 x 13.5 inch mask size, and a customizable substrate holder with a clearance of up to 0.4 inches. The substrate holder provides precise manipulation and positioning of the substrate during the etching and ashing process. It features a Pneumatic Sealer and Door Opener Mechanism to ensure proper sealing, as well as an integrated RF power supply for optimal RF RF etching processes of 4 - 200W. Gen 4 Mask IV also features an advanced PLASMATHERM Vision Control Equipment for user-friendly setup and operation. This system displays real-time etch process control parameters allowing for precise process control such as microwave power, scan rate, etc. Additionally, it features a Built-in OCR Auxiliary Unit for locatability of substrates. This machine makes it possible to locate targets on substrates automatically by analyzing images of multilayered boards with a data-driven approach. PLASMATHERM Gen 4 Mask IV come with an optional Remote Panel Interface to provide remote operation for convenience, as well as a Recipe Management Tool which allows for storage and retrieval of etch recipes, enabling users to recall previous recipes and customize settings in order to optimize the etching and ashing process. The etcher and asher's operating temperature range is 0-35C, making it suitable for a wide range of processes. Overall, Gen 4 Mask IV is a highly-capable etching and ashing solution for a variety of industrial applications. Its user-friendly operation and a suite of advanced features make it the ideal solution for precision etching and ashing processes.