Used PLASMATHERM Gen 4 #9230297 for sale

PLASMATHERM Gen 4 is an industry-leading etch/ash equipment developed by PLASMATHERM for deep etching and ashing applications. The system helps to process a wide variety of materials, including metals, polymers, and compound semiconductors. Gen 4 utilizes a unique ceramic-based etching process that produces precise and detailed features with good edge definition. Additionally, the machine features advanced temperature control for precise rate of etching and ashing. This allows for great reproducibility and repeatability of results with minimal operator intervention. PLASMATHERM Gen 4 features a 22-inch industrial LCD touch-panel interface with a PC-based control unit. This interface enables communication and parameter adjustment in real-time with a user-friendly operating machine. The tool is further enhanced with automated recipe generation that allows users to quickly program the parameters for the desired etch or ash recipe. Gen 4 provides a consistent uniform etch and ash rate that results in highly uniform etching/ashing of materials. The machine also employs advanced dropletless etching technology which ensures that no accumulated droplets of etchant occur during etching/ashing process. PLASMATHERM Gen 4 features a robust construction with stainless steel chamber walls to that are designed to resist corrosion and wear. Additionally, a fluid cooling asset helps maintain optimal chamber temperature even during prolonged etching and ashing processes. The model also makes use of a gas delivery equipment that helps to reduce gas usage while maintaining optimum etch and ash rates. It utilizes an easy to access and replaceable gas delivery manifold for simple routine maintenance. Gen 4 offers a wide range of process tools and components that are essential for production of transparent, conductive-metal-oxide and compound-semiconductor-based devices. The system also features a highly efficient spatial heating unit, allowing for rapid and controllable thermal processes. The machine's optional lock-in etch tool enables the insertion of extremely small features and patterns into substrates.