Used PLASMATHERM Mask IV #9228114 for sale

PLASMATHERM Mask IV is a highly advanced etching/ashing machine that is used in both academic and professional applications. It has been praised for its advanced technologies and high-quality results. Mask IV is equipped with an advanced plasma generator equipment that helps to produce a wide range of process parameters, such as etch depth, amplitude, duration, and so on. Additionally, it utilizes Low-loss Plate Coating Technology that ensures precise film thickness, uniform aspect ratios, and tight geometries. With the full array of precision parameters, this etcher/asher can cover all applications from most advanced research to production needs. The machine is also equipped with a patented Target Alignment System (TAS) that ensures accurate placement of the substrate, mask, and target. This is crucial for getting the best etching results in tight geometries. The VersaDrive positioning unit supplies the necessary stability and accuracy for the TAS's precise movements, while the Deflection-Free Focusing Machine (DFFS) helps to ensure that the etch areas don't deviate from the desired area. This guarantees a high-quality etching performance every time. PLASMATHERM Mask IV also has a series of process monitoring resources to ensure the quality and uniformity of etching results. It has embedded intelligence and process monitoring capability that can restore the process parameters to their defined settings for repeatable etching performance. Also, the rapid thermal load tool can quickly transition the chamber from etch mode to ash mode to ensure the highest level of process uniformity. This etcher/asher is also equipped with a range of safety features. It has a gas monitor asset that triggers an alarm if the chamber reaches a potentially dangerous process level. Additionally, Mask IV has pre-set operation parameters to ensure accurate repeatability of the process and prevent any unsafe conditions. Lastly, the vacuum monitoring capability helps to ensure that only safe vacuum levels are reached in the chamber during the etching process. Overall, PLASMATHERM Mask IV is a highly advanced and powerful etcher/asher that provides users with excellent results. Its advanced technologies are well suited for all applications, from basic research to high volume mass production. Additionally, its safety features help to ensure that the etching process is safe and efficient.