Used PLASMATHERM PLASMA901e-1 #9282868 for sale

PLASMATHERM PLASMA901e-1 is a powerful, reliable and high-precision etcher/asher developed for a wide range of materials. It combines precision control, reliable performance, fast processing, and ease of integration into automated systems or manual uses. PLASMA901e-1 uses a Radio Frequency (RF) plasma source with advanced ePRControl linear step parametrization to provide consistent and uniform operations. This etcher/asher is equipped with a Fully Automated Vacuum Chamber Equipment (FACS) to ensure optimal gas flow and control over the plasma chamber's environment. The FACS includes intelligent management of the process gas flows, as well as a heat exchanger, pumps, and plasma optics elements. As such, PLASMATHERM PLASMA901e-1 is optimized for a wide range of applications, from dielectric layers, doped films and layers, to metal thin-film etching, metal and ceramic alloy etching, and more. PLASMA901e-1 also includes Serial Bus Interface (SBVI) for complete remote connectivity through Ethernet or Modbus TCP/IP, enabling direct communication with the processing system. This allows the user to monitor the etcher/asher's operation in real-time, and adjust parameters or shut down the unit remotely if necessary. PLASMATHERM PLASMA901e-1 was also designed with safety in mind, with an integrated Vacuum Safety Machine (VSS) that ensures secure vacuum operations and compliance with applicable safety regulations. In terms of feedstock, PLASMA901e-1 has a wide range of compatibility, including Crystalline Silicon, Metal Oxides, Silicon Nitrides, Silicon Carbides (SiC), Aluminum Nitrides, Gallium Nitrides, Aluminum Oxides (Al2O3), Nickel Selenides, and other materials. It also enables automated substrate handling through a compatibility with standard Load-Lock systems. PLASMATHERM PLASMA901e-1 features an intuitive user interface that allows for easy setup, configuration, and monitoring of the etcher/asher. It also includes advanced anisotropic etching capabilities thanks to its adjustable etch angle and EasyAxisTM alignment tool, allowing for remarkable precision. Overall, PLASMA901e-1 is a powerful, sophisticated, and reliable etcher/asher, designed for intricate and complex operations on a variety of materials. Its intuitive design, compatibility with different substrates, and powerful advanced adaptive etching make it ideal for automated systems and manual uses alike.