Used PLASMATHERM SL 730 #9132973 for sale

PLASMATHERM SL 730 is an advanced etching and ashing technology designed to meet the needs of multiple applications in industrial and scientific semiconductor device fabrication. It offers high throughput and precision processing for etching and ashing of metals, polymers, SiC and other semiconductor materials. SL 730 includes a patented, embedded, multi-level plasma process technology comprising a unique multi-anode inductively coupled plasma (ICP) process. This is combined with a standard single-level planar on-wafer technique. This advanced configuration ensures the highest precision etching and ashing performance. The device can be used in both batch and continuous batch processing modes. Batch processing of 6" wafers is possible in the standard reactor configuration. The platen size of the reactor can also accommodate 8" and 12" wafers. Continuous mode allows production of large volumes of high-quality product at up to 24 ICPRs/hour. PLASMATHERM SL 730 can be integrated into a variety of semiconductor process systems. It features a robust process stabilization cabinet design with low-noise shielding, bypass technology and advanced temperature control. SL 730 enables high precision, high throughput etching and ashing of metals, polymers, and semiconductors. It utilizes advanced ICP to ensure minimal absorption of material by substrate and for optimal resource utilization. It offers greater process scalability with a large chamber that can accommodate batches of 8" and 12" wafers in both batch and continuous modes. Additionally, its patented embedded technology and low-noise shielding ensures efficient dust collection and renewable process control for consistent results.