Used PLASMATHERM SL 730 #9196400 for sale

Manufacturer
PLASMATHERM
Model
SL 730
ID: 9196400
Wafer Size: 6"
Vintage: 1990
PECVD System, 6" CVD Processor USG 1990 vintage.
PLASMATHERM SL 730 is an etcher/asher equipment designed to aid in plasma etching and ashing processes, with applications in research, development, and production across a range of industries. It is an advanced tool for cost-efficient/high-precision etching and ashing of a variety of materials in high-volume production. The key features of SL 730 are its high-performance microwave generator, high hardware compatibility, high Throughput rate, high process stability, and accuracy. The high-performance microwave generator allows for a maximum etching and ashing speed of 3.5 cm² per minute, resulting in a throughput rate up to 20 times faster than traditional methods. This also allows for a high degree of process stability and accuracy, with the capability to produce parts with repeatability of up to 5µm regardless of the material. The system is also compatible with a wide range of materials, including aluminum, silicon, titanium, tungsten, glass, and plastics, making it highly versatile for working with various materials and product designs. It also features a long and low maintenance life, with a maximum of 10 years, and is designed for low energy consumption, allowing for efficient operation. PLASMATHERM SL 730 also comes with a range of peripherals in order to enhance the capabilities of the unit. These include an adjustable gas box, automatic source replenishment functions, a dual-wafer loader for easy handling, and a variety of etching and ashing tools. This allows users to accurately and consistently etch and ash materials, even at high volumes. SL 730 is ideal for anyone who requires a high-performance and accurate etcher/asher machine, with capabilities suitable for high-volume production and research. It is reliable, low maintenance, and can be used to etch and ash a wide range of materials with a high degree of accuracy, making it the perfect choice for diverse applications.
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