Used PLASMATHERM SLR 720 / 720 #9124178 for sale

ID: 9124178
Wafer Size: 2"-8"
Vintage: 1995
Dual chamber Reactive Ion Etch (RIE), 2"-8" Dual 700 style alumimum chambers with load lock 11 Inch lower electrode on both chambers Advanced energy RFPP RF5S RF power supply AM5 matching network and tuner Dual pumping stacks: Leybold 361 turbo pumps Leybold 150-360 controller Gas pannel consist of (1) side of (4) MFCs (He, N2,N2& N2) (1) side of (4) MFCs (He,N2,CFH3 & C2F6) Leybold D40BCs mechanical pump Leybold D25 BCS mechanicsl pump Neslab HX75 Plasmatherm windows based OS 208V, 60A, 60Hz 3 Phase 1995 vintage.
PLASMATHERM SLR 720 / 720 is a high-performance etcher / asher designed for a wide range of applications requiring both high-throughput and high-precision etching and ashing. This equipment features a smart self-learning robotic control equipment that continuously adjusts the process parameters to optimize the results for a variety of substrates, substrates shapes, and etch depths. The use of SLR 720 / 720 makes etching and ashing solutions easier, faster, and more accurate than ever before. PLASMATHERM SLR 720 / 720 is based on an industrial robotic system and can be configured with a range of dedicated and multi-functional tools that can be mounted on the robot arm. This unit offers a high degree of customization to suit different applications and process requirements. It is compatible with a variety of resolution and application-specific software packages for different etching and ashing solutions. The etching and ashing processes, including the recipe optimization, process control, and loading and unloading of substrates, are managed exclusively through the software interface. SLR 720 / 720 features an advanced part-handling machine that allows for quick and precise loading, unloading, as well as alignment of substrates. The most common solutions include load lock and peristaltic handling systems. The robotic tool further ensures that the etching and ashing tools are precisely controlled and the process parameters are appropriately adjusted for each substrate. PLASMATHERM SLR 720 / 720 supports a wide range of capacity and process variants. This includes the heated chamber technology, two-gas clusters, plasma quenches, and PECVD, as well as etching and ashing technologies such as RIE/ICP, triple-frequency, ALD, CVD, and Sub-Micron Etcher. Additionally, it also supports the controlled addition and removal of chemicals, as well as inline recipes. SLR 720 / 720 is composed of three essential parts. The first is the control cabinet, which houses all the components necessary for robotic control and processing. The second is the etching and ashing chamber, which consists of a built-in nozzle, flange, and cleaning asset. The final part is the etching and ashing model, which includes all the essential tools, such as laser scribe, masks, and detector, as well as the gas boxes. PLASMATHERM SLR 720 / 720 offers a unique combination of features and capabilities for etching and ashing, enabling users to etch and ash both thin and thick substrates with high material utilization and process efficiency. This equipment is ideal for laboratories and other applications requiring high-performance etching and ashing solutions.
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