Used PLASMATHERM SLR 720 #9382253 for sale

Manufacturer
PLASMATHERM
Model
SLR 720
ID: 9382253
Vintage: 1995
Reactive Ion Etcher (RIE) Power supply: 208 V, 60 Hz 1995 vintage.
PLASMATHERM SLR 720 is a high-precision, multi-stage plasma etcher/asher designed specifically for manufacturing ultra-thin filtration components, nanorobotics, MEMS/NEMS devices, and other microelectronics components. The machine features four different chambers (process, pre-clean, load-lock, and etch/ash) which are connected to each other to provide precise plasma etch/ash processing with clean liquid, gas, or nitrogen. The process chamber is the main chamber within the etcher/asher and contains the plasma source, RF and DC power supply, and wafer safety sensors. It also has advanced plasma sensor and etch-rate measurement systems for exceptional control. The pre-clean chamber is a dedicated chamber with a high-pressure, ambient-temperature, and low-humidity process gas for cleaning and degassing before etching or ashing. It also allows for accurate orientation of the wafer. The load-lock chamber further improves the cleanliness of the process chamber to provide a higher quality etching/ashing process by providing an ultra-high-vacuum environment to the process chamber. The etch/ash chamber is the last stage of the entire machine and contains a number of different process gases, tailored according to the specific etching/ashing process. The gas source typically includes fluorine-based plasma gases such as CF4, CHF3, and CF3Br, as well as oxygen and other inert gases. The production yield and final quality is optimized by the accurate control of all process parameters such as pressure, flow rate, temperature, gas type, and substrate temperature. Additional features and process options of SLR 720 include: automatic thickness measurement, on-board computer control, manual process control, adjustable detection and dielectric-etching windows, LCD touchscreen interface, central data acquisition/archive console, active wafer monitoring, real-time display of etch rates, defectless wafer handling, automatic process repeatability, and complete integration into production systems. All of these features combined with its advanced plasma etch/ash process, make PLASMATHERM SLR 720 an ideal tool for producing ultra-thin filtration components, nanorobotics, MEMS/NEMS devices, and other advanced microelectronics components with the highest quality.
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