Used PLASMATHERM SLR 730 #293663368 for sale

PLASMATHERM SLR 730 is a plasma etcher and asher device designed for use in the semiconductor industry. It features an advanced design with a modular process chamber capable of delivering very high uniformity and repeatability. This industrial-grade device is capable of both etching and ashing applications and is ideal for etching processes on narrow geometries down to 0.08µm. The process chamber is constructed from a patented material, designed to offer superior resistance against corrosion and handling. It also features a recessed, replaceable water jacket for improved substrate cooling. The process chamber includes a robust etch/ash platen and an electrostatic chuck for repeatable substrate clamping with minimized susceptibilities. This platen is coaxial with the bell jar, providing more precise ultrathin film etch/ash capabilities. The control electronics have been improved to provide a completely automated etching process with an integrated graphical user interface. Through this interface, one can preset, store, and track each process recipe. Additionally, there is an integrated supervisory process for efficient management of the system components. This design provides high-precision process control with uniform coverage at a consistent wafer temperature. The gas delivery system offers aggressive control of multiple, simultaneous gas flows. Up to three gas sources can be delivered through a dedicated gas box within a single chamber. The gas box includes an integrated mass flow controller and gas analyzer with flexible sampling capabilities for diligent process control. There is also a built-in plasma support network which is able to sense and monitor plasma conditions. The PCW 208 power supply unit is a high-end, digital-based source appropriate for most RIE etching and ashing applications. This device offers adjustable pulse width and repetition rate for extended process range. It is also designed with two separate independantly-controlled output when combined with a high ceramic isolation transformer. PLASMATHERM SLR-730 is capable of both etching and ashing applications. Its smart design and advanced controls provide the power and precision needed to produce high-quality results. This device is perfect for advanced etching processes demanding uniform coverage with low wafer-to-wafer variations. With its integrated gas box and high-end PCW 208 power supply, SLR 730 is sure to prove itself a valuable asset to any semiconductor manufacturer.