Used PLASMATHERM SLR 730 #9124186 for sale

Manufacturer
PLASMATHERM
Model
SLR 730
ID: 9124186
Wafer Size: 1"-8"
Vintage: 1989
Shuttle lock PECVD deposition system, 1"-8" MKS 286 mass flow controller (7) MFCs (N2,N2,He,N2,NH3,SF6,N2 Power supply: RFPP 5S RF Matching network & tuner MKS 290 Ion gauge controller MKS 252 exhaust controller Watlow substrate heater Windows OS with monitor Keyboard & mouse 1989 vintage.
PLASMATHERM SLR 730 is a high accuracy, programmable RF Under-etch Asher/Etch equipment for the etching and removal of metal layers. Its capabilities include: etching of gold, copper and aluminum layers; etching of resist pattern on gold, copper and aluminum layers; Ashing of photoresist layers; application of solvent prior to ashing and auto-up assist for temperature adjustment. The system's specialty is that it is designed to process samples quickly, due to its efficient use of RF power and the availability of short pulse duration. The basic unit of PLASMATHERM SLR-730 is composed of a plasma generator, a bevel-mask chuck and jets and chamber. The plasma generator provides RF energy and provides the power needed to etch away or remove photoresist layers during etching and ashing. Bevel-mask locks are also included for reliable vacuum containment of samples. SLR 730 also has a user-friendly interface that allows programming of etch and ash times as well as power and solvent levels. SLR-730 has an etch rate of 1.5 to 4.5 μm/min and 0.75-10.0 μm/min for aluminum. It has a chamber temperature range of 25-250 °C and a power range of 1-100 Watts. Additionally, the unit features a selectable atmospheric environment with either vacuum or pressure of up to 10 torr. It offers repeatable results with excellent sidewall etch predictability because of its consistent variation in pulse duration. The machine also provides auto-up-assist temperature control that helps adjust the set-point as needed for different etch or ash recipes. PLASMATHERM SLR 730 has a number of unique safety features that ensure the safety of the user and the environment. It has a noise absorber that minimizes acoustic noise and an integrated acoustic emission tool that monitors acoustic levels in real-time. A fine-grained monitoring asset is also available that alerts the user to possible danger during the etch/ash cycle. The model is also designed to shut down in the event of any mechanical failure or power outages. These features, combined with the performance capabilities of the equipment, make it an excellent choice for laboratories, research and production facilities.
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