Used PLASMATHERM SLR 730 #9132975 for sale

PLASMATHERM SLR 730 is a fully automated Etcher / Asher designed to be used in a wide variety of precision applications. It is the ideal choice for rapid and efficient removal of thin film deposition over substrate, and it is also used for performing process steps such as encapsulation and dielectric removal. PLASMATHERM SLR-730 has a number of unique features which make it a great choice for processing any type of semiconductor structure. SLR 730 has a large working chamber that is made from stainless steel and is equipped with a high grade process gas delivery equipment. This ensures that the chamber is kept clean and free of contaminants during the etching or ashing process. The etching and ashing process utilizes a pure oxygen and argon mixture with excellent uniformity, which can etch quickly and with a very high precision etch rate. The etching and ashing process is bolstered by a patented high thermal efficiency Class 5 protection gas distribution mechanism, which permits high efficiency energy transfer and uniform etch results across the sample substrate. The chamber also comes equipped with a customized and self-adjusting water vapor source and scrubber to ensure efficient cleaning of the chamber between process steps. The scrubber purges the chamber of particulate matter, ensuring that the adjacent surface areas are completely clean prior to the next process step. SLR-730 also comes with a multi-directional laser profile system, which enables precise profiling throughout the process. The etch rate is constantly monitored to ensure a uniform profile, and the multi-directional laser profile unit allows operators to maximize process results without over etching sensitive areas of the substrate. Furthermore, PLASMATHERM SLR 730 also features a user friendly control interface which permits adjustments to the process parameters, allowing the operator to easily tailor the etching and ashing process to the type of material being etched. This allows the operator to easily optimize the results for each substrate type and to determine the optimal process setup quickly and efficiently. Overall, PLASMATHERM SLR-730 is a versatile and powerful etcher / asher which is designed for use in a wide range of precision applications. It offers a combination of quick and efficient etching or ashing of thin film deposition over substrates, as well as the ability to perform several process steps such as encapsulation and dielectric removal. The user friendly control interface makes it easy to tailor the process to the substrate type, and the adaptable laser profile machine allows for accurate profiling. All of these features combine to provide an extremely powerful etching and ashing tool for any semiconductor structure.