Used PLASMATHERM SLR 770 ICP #293771258 for sale

PLASMATHERM SLR 770 ICP is a cutting-edge plasma etcher/asher equipment designed for advanced semiconductor fabrication processes in research and industrial settings. This system offers superior process control, precise etching capabilities, and excellent uniformity for high-quality device manufacturing. At the heart of PLASMATHERM SLR 770 lies the inductively coupled plasma (ICP) source, which generates a high-density, low-pressure plasma for highly efficient and uniform etching. This technology enables the unit to achieve high etch rates and selectivity while maintaining low damage to the substrate, making it ideal for a wide range of applications including compound semiconductor processing, MEMS fabrication, and advanced logic and memory devices. The machine features a spacious process chamber that can accommodate substrates up to 200 mm in diameter, allowing for batch processing and increased throughput. The chamber is equipped with advanced temperature control mechanisms to ensure stable process conditions and consistent results across multiple runs. Additionally, the chamber is designed with superior gas distribution and exhaust systems to maintain uniform plasma density and etching profiles. SLR-770 ICP offers a wide range of process gases and precursors to support various etching chemistries and material compatibility. The tool's gas delivery asset is equipped with mass flow controllers for precise control of gas flow rates, ensuring accurate process control and reproducibility. Additionally, the model features a high-capacity gas abatement equipment to safely remove toxic byproducts and waste gases generated during the etching process. One of the key features of SLR 770 is its advanced RF bias capability, which allows for independent control of ion energy and substrate temperature during the etching process. This feature enables fine-tuning of process parameters to achieve specific etching profiles, selectivity, and sidewall passivation, resulting in high-quality etched features with minimal damage and sidewall roughness. The system is equipped with a user-friendly interface and software control unit that enables easy programming, monitoring, and data logging of process parameters. Operators can easily configure and optimize etching recipes, run diagnostic tests, and troubleshoot any issues using the intuitive interface. The machine also offers remote monitoring and control capabilities, allowing for real-time process adjustments and performance optimization. In summary, SLR 770 ICP is a state-of-the-art plasma etcher/asher tool that offers advanced process capabilities, precise control, and high reliability for semiconductor fabrication applications. With its cutting-edge technology, superior performance, and user-friendly interface, this asset is an ideal choice for research institutions and semiconductor manufacturers looking to achieve high-quality etched features with exceptional process control and uniformity.