Used PLASMATHERM SLR 770 #9271304 for sale

PLASMATHERM SLR 770 is an etching equipment specifically designed for semiconductor fabrication applications. Its purpose is to etch away layers of unwanted material from the surface of a substrate such as a silicon wafer. SLR 770 utilizes plasma-based technology for efficient, highly accurate, and repeatable etching. The system consists of three main components, an electrode (which is the large electrode located near the bottom of the unit), an ion source, and an etching chamber. The etching chamber itself is made from stainless steel and is hermetically sealed. Inside the chamber, etching gases are introduced through a series of gas channels and are emitted from nozzles located around the edges. An RF generator is then used to create a plasma field, allowing the etching gas to be activated and ionized. Due to the highly efficient process, the etching can be more precisely controlled and repeatable etching profiles can be achieved. PLASMATHERM SLR 770 can etch away at a variety of materials, including silicon, polysilicon, metals, glasses, oxides, and nitrides. An on-board vacuum pump ensures that the chamber is operating in a low-pressure environment while etching, resulting in better etching performance, repeatability, and precision. Additionally, the unit has an automated wafer-handling machine, allowing substrates to be quickly and easily placed in the etching chamber and then removed afterwards. SLR 770 also includes advanced control features that allow users to program etching protocols that suit different jobs and tasks. For example, the user can set up a program to etch at a certain depth, with a particular gas composition, or with a specific etch rate. This allows the tool to be tailored to suit the needs of any job. Overall, PLASMATHERM SLR 770 is a powerful etching asset designed for the most exacting semiconductor fabrication applications. It features precise controls, repeatable etching profiles, and advanced programming capabilities to provide highly efficient etching of a variety of materials with superb repeatability.