Used PLASMATHERM SLR 770 #9407588 for sale

Name: PLASMATHERM SLR 770
Brand: PLASMATHERM
SKU: 9407588
Availability: InStock

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Etchers / Ashers

Manufacturer

PLASMATHERM

Model

SLR 770

ID: 9407588

Wafer Size: 6"

Inductively coupled Plasma (ICP) Etcher, 6" Controller type: PC Upgraded ICP Process Module (PM) High power ICP Applicator Lower electrode, φ 10" Ceramic wafer clamp Helium backside cooling Load lock chamber with linear robotic arm Load lock arm with programmable stepper motor and controller Gas distribution box with 4 Gas channels MKS 1479 Metal sealed mass flow controllers Option: 4 Gas channels (2) RFPP AMNPS-2A Auto matching network controllers RFPP RF5S RF Generator: 500 W at 13.56 MHz RFPP AMN-5 500 W Auto matching network RFPP RF20M RF Generator: 2000 W at 2.0 MHz RFPP AMN-20 2KW Auto matching network SHIMADZU TMP1003 MAG LEV Turbo pump with controller VAT 64 Rectangular throttle valve with VAT PM5 Controller INFICON MPG500 Ion gauge on ICP Chamber MKS 325 Moducell Pirani gauge on load lock WATLOW Three zone chamber heater controller EDWARDS QDP80 Dry roughing pump on process module AGILENT DS 302 Mechanical pump on load lock SMC HRR018 Rack mount chiller; 5°C - 45°C Temperature range Analog and Digital I/O Modules controlled by BECKHOFF Ethernet I/O Via Modbus TCP/IP Communications protocol Pneumatic valves controlled by SMC Modules via Modbus TCP/IP Communications protocol PC: UBUNTU LINUX OS Intel I7 CPU at 3.4 GHz 16 GB RAM 500 GB SSD SMC Pneumatic valves Standard flat panel monitor, 2" Keyboard Mouse Electrical disconnect box - 208 VAC, 60 Hz, 3-Phase.

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PLASMATHERM SLR 770 is a single-wafer plasma etcher/asher and is one of the most advanced models available on the market. It offers a unique combination of features that enable users to clean, etch, and asher various substrates with unprecedented levels of precision. The machine is equipped with a range of features that enable it to operate as both an etcher and asher. It is capable of controlling the etching and ashing process with an accuracy of up to 0.1 μm thanks to its advanced mass flow controller and embedded data logging system. The machine has a programmable process gas supply. This makes it possible for users to optimize the etching and ashing parameters for a particular application and to switch between etching and ashing in the middle of the process. The machine also boasts a truly remarkable level of precision. It has an oxygen abundance and cleaning accuracy of up to 0.001%. The machine also has a very powerful ion beam that allows it to etch, asher and clean with a very high degree of control. The machine is designed with safety in mind and has a closed-loop process chamber that ensures a high level of safety. The chamber also features an acoustic-dampening design and is able to hold a vacuum at up to 760 mbar and the operating pressure is adjustable. The machine is also very cost effective. It is able to etch and asher quickly and efficiently, and its running costs are very low compared to other models on the market. Overall, SLR 770 is an advanced machine that is a great choice for any etching or ashing process. Its combination of accuracy, safety, and cost-effectiveness makes it an ideal choice for precise and efficient etching and ashing.