Used PLASMATHERM SLR 770B #9302637 for sale
URL successfully copied!
Tap to zoom
ID: 9302637
Wafer Size: 4"
Vintage: 1998
Deep Reactive Ion Etcher (DRIE), 4"
With 6" kit
Etching silicon uses photoresist mask
Gasses:
Argon for plasma
Sulfur Hexafluoride (SF6) for Silicon etching
Octafluorocyclobutane (C4F8) for passivation layer
Oxygen (O2) for chamber clean
Nitrogen (N2) for venting
1998 vintage.
PLASMATHERM SLR 770B is a unique etch and asher equipment that combines the processes of both etching and ashing in a single platform. This system utilizes a proprietary Plasma-Therm Pro-Lift™ technique to achieve a higher degree of precision and repeatability along with significant cost savings. By utilizing both RF and DC plasma etch and ashing processes, the unit is ideal for a variety of etch and ashing applications. As an example, this technique is used to control the etch profile throughout an inhomogenous mask. The standard SLR 770B machine provides an open-load-position feature which allows on-board wet etching and ashing processes. This tool can also accommodate a wide range of substrates from metallic or plastic-based materials for greater versatility. The machine is also designed with an advanced shutter and lift asset that provides an optimal etching window to promote uniform etch depth, profile control, and repeatability. Additionally, the model also includes a nitrogen supply to reduce contamination and oxides during the plasma etching and ashing processes. The equipment's direct-drive conveyor system supplies consistent and customizable etching and ashing speed for maximum safety and efficiency. PLASMATHERM SLR 770B's temperature control capabilities also ensure an efficient, high-quality and safe etching and ashing process, free from any particle contamination. The unit also offers a wide range of accessories such as shuttle plates, pedestals, lifts, and masks, to meet the most demanding etching and ashing needs. SLR 770B is designed to meet a wide range of production requirements. It provides the capability to run nitride etching, etching of deep silicon trenches or small high-resolution features, and ashing of organic residue or metals. The machine also offers faster turn times and secure, repeatability along with cleanroom-safe operations. The Pro-Lift™ window technique promotes uniformity and excellent thermal insulation, further increasing process repeatability and quality. PLASMATHERM SLR 770B is perfect for etching or ashing high-precision systems from substrates ranging in dimensions from 5 to 500 mm. Its wide range of safety features provide a safe and reliable operation. The tool is ISO 9001 certified and is perfect for those who require consistent, high-quality etching and ashing results. With competitive pricing, SLR 770B is an ideal investment for those in need of an etch and asher asset.
There are no reviews yet