Used PLASMATHERM SYSTEM OME STRIPPER MODEL 105 #9282873 for sale

PLASMATHERM OME STRIPPER MODEL 105 is a professional-grade etcher and asher used for research and private industrial applications. The OME STRIPPER is capable of etching and ashing substrates of almost any size, shape, and material composition. This model features a specialized vacuum chamber design which reduces electron sputtering effects on the substrates, which helps to ensure high etch rates and uniformity. Internal walls are made from 316 stainless steel, and the interior chamber is coated with a chemical agent to ensure that a homogeneous vacuum is created. The vacuum is generated by a drop-style oil-sealed rotary vane pump which provides a maximum pumping speed of 450 liters per minute. The OME STRIPPER features an easy to use control panel with digital displays for vacuum control, temperature, and other parameters. Real-time process control is achieved through the use of sensors situated within the chamber which monitor substrate temperature, pressure, and electrostatic fields. This ensures that the desired etch result is accurately obtained. In addition, the OME STRIPPER also features a high-resolution photometer which can measure the exact amount of material removed. This allows the operator to fine-tune the etch process in order to obtain the desired surface results. The OME STRIPPER is a versatile tool which can be used to etch and asher a wide range of materials, including ceramics, quartz, and semiconductors. The chamber is designed to accommodate substrates of up to 5" in diameter, and the power supply has a maximum rating of 40 amps per 300V AC. The solid-state plasma system used by the OME STRIPPER is also extremely efficient. It is able to produce a reliable and uniform etch process which can be completed in a matter of minutes. This helps to reduce time and cost associated with the etching process. Overall, PLASMATHERM OME STRIPPER MODEL 105 is an advanced etcher and asher specifically designed for laboratory and industrial use. It features a specialized design which reduces electron sputtering effects, and offers real-time process control, high-resolution photometers for precise measurement, and a powerful and efficient plasma system for quick and accurate etching results.