Used PLASMATHERM / UNAXIS 760 #9314655 for sale

PLASMATHERM / UNAXIS 760 etcher/asher from UNAXIS is an advanced technology chamber designed for plasma etching and ashing processes. By creating a high purity environment in a closed chamber, UNAXIS 760 provides reliable and repeatable micro-processing. This precision wet etcher and asher utilizes single-ended and/or dual-frequency high frequency power sources to enable high repeatability and precision etching and ashing applications. PLASMATHERM 760 has a thermally-insulated etching and ashing chamber with a variable operating pressure between 0.1 to 1 Torr and temperatures between -20 to 100 °C. The high-precision etching processes in 760 are enabled by a RF biasing generator and an advanced process control module. An adjustable clamshell cover which can be up to 250mm in diameter, provides easy install and unloading of the sample. The unit enables a variety of anisotropic and isotropic etch processes and with optimal etch rates achievable for silicon, silicon dioxide, polyimide, and other materials. PLASMATHERM / UNAXIS 760 incorporates advanced safeties like automated gas safety shut offs, exhaust system safeties, process pressure failure detection, and over current shut-off. The chamber also has ozone and CO2 scrubbers, enabling high repeatability and a low debris chamber. The loader and robofeatures of the unit allow for flexible and automatic wafer handling. A robotic cell on UNAXIS 760 can be expanded from a minimum of 4 to a maximum of 8 cassette slots, enabling automated scanning and etch processing of batches of wafers on the unit. The advanced ChamberView technology enables remote access to the chamber and allows users to monitor the chamber control parameters, receive alarms, and send commands from any location. The open Windows-based platform Monitor software is a convenient and user friendly platform for monitoring, controlling, and documenting etching processes. Overall, PLASMATHERM 760 from PLASMATHERM is an effective and efficient solution for high-precision etching and ashing applications. With its high precision controls, automated wafer handling capabilities, advanced remote access features and its sophisticated chamber design, 760 is an ideal choice for various etching requirements.